Self‐Catalyzed GaAs nanorods (NRs) were grown directly on Silicon (100) and (111) substrates via Molecular Beam Epitaxy. Scanning Electron Microscopy shows that the nanorod lengths ranging from 1 to 12 um with diameter between 30 to 200 nm can be achieved. It is established that nanorod growth is favored between 660 to 680 °C, time studies reveal that NRs grow initially via a VLS mechanism and that Ga flux influences the tilt angle of NRs.

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