The consumer appetite for a rich multimedia experience drives technology development for mobile hand‐held devices and the infrastructure to support them. Enhancements in functionality, speed, and user experience are derived from advancements in CMOS technology. The technical challenges in developing each successive CMOS technology node to support these enhancements have become increasingly difficult. These trends have motivated the CMOS business towards a collaborative approach based on strategic partnerships. This paper describes our model and experience of CMOS development, based on multi‐dimensional industrial and academic partnerships. We provide to our process equipment, materials, and simulation partners, as well as to our silicon foundry partners, the detailed requirements for future integrated circuit products. This is done very early in the development cycle to ensure that these requirements can be met. In order to determine these fundamental requirements, we rely on a strategy that requires strong interaction between process and device simulation, physical and chemical analytical methods, and research at academic institutions. This learning is shared with each project partner to address integration and manufacturing issues encountered during CMOS technology development from its inception through product ramp. We utilize TI’s core strengths in physical analysis, unit processes and integration, yield ramp, reliability, and product engineering to support this technological development. Finally, this paper presents examples of the advancement of CMOS doping technology for the 28 nm node and beyond through this development model.
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Research Article| January 07 2011
Advancement of CMOS Doping Technology in an External Development Framework
James J. Chambers;
AIP Conf. Proc. 1321, 31–36 (2011)
Amitabh Jain, James J. Chambers, Judy B. Shaw; Advancement of CMOS Doping Technology in an External Development Framework. AIP Conf. Proc. 7 January 2011; 1321 (1): 31–36. https://doi.org/10.1063/1.3548397
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