Thin films of LiCoO2 were grown by rf magnetron sputtering technique and studied the influence of In situ annealing treatment on microstructural and electrochemical properties of the films. Annealing treatment in presence of O2 ambient develops characteristic (104) plan in relative to (003) plane texture indicating that the films have HT‐layered structure with Rm symmetry. The effect is discussed in terms of grain size, cycling stability, reversibility and the specific discharge capacity.

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