Effects of Growth Conditions on the Low Temperature Photoluminescence Spectra of (111) 3C‐SiC Layers Grown by Chemical Vapor Deposition on 3C‐SiC Seeds grown by the Vapor‐Liquid‐Solid Technique

We report the results of a low temperature photoluminescence investigation of 3C‐SiC samples grown by chemical vapor deposition on vapor‐liquid‐solid seeds. The main parameters tested in this series of samples were i°) the effects of changing the C/Si ratio and ii°) the growth temperature on the final growth product. On the first series the C/Si ratio varied from 1 to 14 for a constant growth temperature of 1550° C. For the second series, the growth temperature varied from 1450 to 1650° C by steps of 50° C with a constant C/Si ratio equal to 3. According to this work, the best results (minimum incorporation of impurities and best crystal quality) were obtained when using a C/Si ratio of 3 at 1650° C.