SyLMAND, the Synchrotron Laboratory for Micro and Nano Devices at the Canadian Light Source, consists of a dedicated X‐ray lithography beamline on a bend magnet port, and process support laboratories in a clean room environment. The beamline includes a double mirror system with flat, chromium‐coated silicon mirrors operated at varying grazing angles of incidence (4 mrad to 45 mrad) for spectral adjustment by high energy cut‐off. Each mirror can be independently moved by two stepper motors to precisely control the pitch and vertical position. We present in this paper the machine protection system implemented in the double mirror system to allow for safe operation of the two mirrors and to avoid consequences of potential stepper motor malfunction.

Topics
Stepper motors, X-ray lithography, Nanotechnology applications, Diffraction optics, Geometrical optics, Synchrotrons
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© 2010 American Institute of Physics.
2010
American Institute of Physics
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