EXCEED9600A was developed not only as medium current implanter, but also as implanter for the high energy range. The energy domain that can be used is 3 to 320 keV in single ion operation. In comparison with EXCEED3000AH implanter (3 to 250 keV), the upper energy limit has been increased by 70 keV. Comparing with EXCEED3000AH, most of the system components are the same, except for the high voltage cabinet and acceleration tube, which have increased volume and length, respectively. Several productivity improvement functions are added, for example, throughput has been improved by reducing auto set‐up time. In this paper, the detailed machine performance is reviewed and the improved productivity and the reliability characteristics are also precisely explained.
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3 November 2008
ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology
8–13 June 2008
Monterey (California)
Research Article|
November 03 2008
Advanced Middle‐High Energy Range Medium Current Implanter EXCEED9600A Available to Purchase
Takashi Nogami;
Takashi Nogami
Nissin Ion Equipment Co., LTD. (Kyoto, Japan)
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Masayoshi Hino;
Masayoshi Hino
Nissin Ion Equipment Co., LTD. (Kyoto, Japan)
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Tomoaki Kobayashi;
Tomoaki Kobayashi
Nissin Ion Equipment Co., LTD. (Kyoto, Japan)
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Hideki Fujita;
Hideki Fujita
Nissin Ion Equipment Co., LTD. (Kyoto, Japan)
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Takao Matsumoto
Takao Matsumoto
Nissin Ion Equipment Co., LTD. (Kyoto, Japan)
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Takashi Nogami
Masayoshi Hino
Tomoaki Kobayashi
Hideki Fujita
Takao Matsumoto
Nissin Ion Equipment Co., LTD. (Kyoto, Japan)
AIP Conf. Proc. 1066, 308–311 (2008)
Citation
Takashi Nogami, Masayoshi Hino, Tomoaki Kobayashi, Hideki Fujita, Takao Matsumoto; Advanced Middle‐High Energy Range Medium Current Implanter EXCEED9600A. AIP Conf. Proc. 3 November 2008; 1066 (1): 308–311. https://doi.org/10.1063/1.3033620
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