We have investigated the approach of ion induced layer separation process for layer splitting from Cadmium Zinc Telluride (CZT) bulk single crystal and transferring and bonding the separated layers with Silicon (Si) wafers. Layer separation experiments have been carried out at UES using 1 MeV ions from the high energy accelerator (1.7 MV Tandetron). Ion dose and annealing temperature for complete separation of size layers have been optimized. Bonding of CZT with Si was accomplished using various IR transmitting chalcogenide glasses. Cracking of separated CZT films was occurring for chalcogenide glass bonded films. Optimization of thermal treatment has led to the minimization of such cracks. Detailed characterizations of the separated films will be presented.
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3 November 2008
ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology
8–13 June 2008
Monterey (California)
Research Article|
November 03 2008
Ion Beam Layer Separation of Cadmium Zinc Telluride
Rabi S. Bhattacharya;
Rabi S. Bhattacharya
aUES, Inc. 4401 Dayton‐Xenia Road, Dayton, OH 45432
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P. He;
P. He
aUES, Inc. 4401 Dayton‐Xenia Road, Dayton, OH 45432
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Y. Xu;
Y. Xu
aUES, Inc. 4401 Dayton‐Xenia Road, Dayton, OH 45432
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M. Goorsky
M. Goorsky
bUniversity of California at Los Angeles, 10920 Wilshire Blvd, Suite 107, Los Angeles CA 90024
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AIP Conf. Proc. 1066, 221–224 (2008)
Citation
Rabi S. Bhattacharya, P. He, Y. Xu, M. Goorsky; Ion Beam Layer Separation of Cadmium Zinc Telluride. AIP Conf. Proc. 3 November 2008; 1066 (1): 221–224. https://doi.org/10.1063/1.3033597
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