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    Journal Articles

    Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging

    Lert Chayanun, Janka Biznárová, Lunjie Zeng, Per Malmberg, Andreas Nylander, Amr Osman, Marcus Rommel, Pui Lam Tam, Eva Olsson, Per Delsing, August Yurgens, Jonas Bylander, Anita Fadavi Roudsari
    Journal: APL Quantum
    APL Quantum 1, 026115 (2024)
    https://doi.org/10.1063/5.0208140
    Published: June 2024
    Abstract
    View article titled, Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging
    Open the PDF for Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging in another window
    • Online ISSN 2835-0103
    • Print ISSN 2835-0103

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