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Journal Articles
XPS analysis of F-containing NiO nanoarchitectures fabricated by plasma-assisted chemical vapor deposition
Open Access
Journal:
Surface Science Spectra
Surf. Sci. Spectra 32, 024005 (2025)
Published: July 2025
Journal Articles
Enhanced collagenogenesis on three-dimensionally printed titanium surfaces by human gingival fibroblasts: An in vitro study
Available to PurchaseVitor de Toledo Stuani, Isabela Sanches Pompeo da Silva, Gustavo Gonçalves do Prado Manfredi, Fernanda Balestrero Cassiano, Larissa Alamo, Ligia Espoliar Corrêa, Jamil Awad Shibli, Carlos Alberto de Souza Costa, Diana Gabriela Soares
Journal:
Biointerphases
Biointerphases 20, 041002 (2025)
Published: July 2025
Journal Articles
Rainer Hippler, Anna Kapran, Harm Wulff, Natalia Nepomniashchaia, Zdenek Remes, Jiri Olejnicek, Martin Cada, Zdenek Hubicka
J. Vac. Sci. Technol. A 43, 053002 (2025)
Published: July 2025
Journal Articles
Influence of interface structure on the bonding strength between alumina and diamondlike carbon deposited by plasma-enhanced chemical vapor deposition
Available to Purchase
J. Vac. Sci. Technol. A 43, 053401 (2025)
Published: July 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 043414 (2025)
Published: July 2025
Journal Articles
Laser oscillation from a distributed feedback structure with a diffraction grating directly fabricated on an organic crystal surface using a focused ion beam and plasma etching
Yuhi Inada, Momonosuke Odani, Shuya Murakami, Haruki Kishimoto, Yuya Arita, Kazuo Takahashi, Takeshi Yamao
J. Vac. Sci. Technol. B 43, 042210 (2025)
Published: July 2025
Journal Articles
Combining molecular beam epitaxy and low-energy electron microscopy with in situ magnetic susceptibility measurements within an integrated ultrahigh vacuum system
J. Vac. Sci. Technol. A 43, 042703 (2025)
Published: July 2025
Journal Articles
Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors
Available to PurchaseSuwan Lee, Junmo Kim, Beomho Won, Jiyeong Park, Ashshi Kumar, Jiye Baek, Jin Su Lee, Chang-Hwa Jung, Hanjin Lim, Hyungtak Seo
J. Vac. Sci. Technol. A 43, 043210 (2025)
Published: July 2025
Journal Articles
Characterization of iron-based alloy catalysts for atmospheric pressure chemical vapor deposition of carbon nanofibers via in situ transmission electron microscopy
J. Vac. Sci. Technol. B 43, 040601 (2025)
Published: July 2025
Journal Articles
Journal Articles
B. D. Rummel, J. P. Klesko, M. L. Meyerson, J. A. Ohlhausen, C. E. Glaser, A. T. Binder, P. T. Dickens, R. J. Kaplar
J. Vac. Sci. Technol. A 43, 042407 (2025)
Published: June 2025
Journal Articles
Influence of annealing on the resistive switching properties of YBa2Cu3O7−x/Nb:SrTiO3 heterostructures
Available to Purchase
J. Vac. Sci. Technol. B 43, 042208 (2025)
Published: June 2025
Journal Articles
Metalorganic chemical vapor deposition epitaxy of β-Ga2O3 films on (001) Ga2O3 substrates with fast growth rates
Available to Purchase
J. Vac. Sci. Technol. A 43, 042702 (2025)
Published: June 2025
Journal Articles
Plasma dynamics of modulated pulsed power magnetron sputtered Cr target in an Ar-He atmosphere
Available to Purchase
J. Vac. Sci. Technol. A 43, 043109 (2025)
Published: June 2025
Journal Articles
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma
Junji Kataoka, Norikatsu Sasao, Koji Asakawa, Shuichi Kuboi, Daiki Iino, Kazuaki Kurihara, Hiroyuki Fukumizu
J. Vac. Sci. Technol. A 43, 043008 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. B 43, 044004 (2025)
Published: June 2025
Journal Articles
Tuning the crystallinity of TiO2 coatings synthesized by an atmospheric pressure dielectric barrier discharge in a single step process
Available to PurchaseNicolas Fosseur, Thomas Fontaine, David Petitjean, Loïc Malet, Rony Snyders, Stéphane Godet, François Reniers
J. Vac. Sci. Technol. A 43, 043413 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 043007 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 042603 (2025)
Published: June 2025
Journal Articles
Plasma enhanced atomic layer deposition of HfO2—A potential gate dielectric for GaN-based devices
Open AccessPallabi Paul, Enrico Brusaterra, Ina Ostermay, Eldad Bahat Treidel, Frank Brunner, Anna Mogilatenko, Kashyap Udas, Jos Boschker, Oliver Hilt, Olaf Krüger
J. Vac. Sci. Technol. A 43, 042406 (2025)
Published: June 2025
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